step-and-repeat nanoimprint lithography frame SET NPS300
The lithography system have 2 printing heads (UV NIL@365 nm and Thermal-RT to 450°C) and will allow the replication of structured patterns (on areas from 2 to 40 mm²) on a pad either made of transparent material (PDMS or glass or other plastic) or opaque material (silicon, metal or other) to a substrate (from cm² to 200 mm diameter plate) coated with either a UV sensitive material or a thermo sensitive material. The equipment allows to replicate the same patterns from the same mold several times step by step (“Step and Repeat” mode). Replication of the smallest patterns will be possible for dimensions smaller than 20nm and field connections between each print as small as possible not exceeding 20µm in both X and Y mps directions.
Contact Task Facility Manager (TFM)
04 72 44 62 82
Depending structure
The goal of INL is to encourage world-leading multidisciplinary research in the areas of micro and nanotechnologies and their applications. The pioneering research undertaken at the Institute ranges from materials and technology to devices and systems, thus enabling the emergence of dedicated technologies. The Institute is supported in its work by the Nanolyon Technology Platform.
Other's Laboratory/Plateforme
Laboratory : NanoLyon
Federation :
FRAMA, C2I@L
Lab tutorship :
UCBL-CNRS-INSA-ECL-CPE
1 rue E. Fermi
Bâtiment Irène Joliot Curie
69622 Villeurbanne
Continuous education :
Access with light support :
Open to academic :
Open to enterprises :
