Diener Vacuum Plasma

Materials preparation > Plasma cleaning

The plasma process, low frequency 200W@ 80kHz and microwave 300W@ 2.45GHz with Ar N2 H2 O2 NH3 gas, allows:
Material cleaning: Plasma technology offers solutions for any type of contamination and any substrate regardless of subsequent processing. Molecular contamination residues are also evacuated.
Activation of materials: Good surface wettability is the prerequisite for the adhesion of elements when applying paints, glues, printing or binders.

Contact Task Facility Manager (TFM)

0472448174

Depending structure

Laboratoire Ampère

36, avenue Guy de Collongue
Bâtiment H9
69134 Ecully Cedex
04 7218 6099

infos : Website

The Laboratory is structured into 3 Scientific Departments :

      Electrical Energy (EE): create and optimize devices for transporting, distributing and converting electrical energy, taking into account their environments
      Bio-Engineering (BIO): bring out fundamental concepts, methods and applications in bioengineering.
      Automation for Systems Engineering (AIS): development of methodologies and tools aimed at optimizing and controlling the dynamic behavior of systems

Keywords :

      Electrical Engineering Materials, Power Electronics, High Voltage, Electromagnetic Compatibility, Electromagnetic Modeling, Electrical Energy Storage Systems
      Control-command, Mechatronics, Fluid power, Medical robotics, Diagnostics and operating safety
      Gene Transfers and Bacterial Adaptation, Ecologi

Other's Laboratory/Plateforme

Email


Laboratory : Packaging & Plastronique 3D

LOMBARD Philippe

Responsable Plateforme

Depending structure : Laboratoire Ampère
Lab tutorship :

Université de Lyon ; Université Claude Bernard Lyon 1– Ecole Centrale de Lyon – INSA de Lyon – CNRS


21, avenue Jean Capelle
Bât. Léonard de Vinci – 3° étage
69622 Villeurbanne

Full support :
Continuous education :
Access with light support :
Open to academic :
Open to enterprises :

MEANS.FR

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