Ion Assisted Deposition System (IAD) - VPTECH model
  • Oxides
  • Metal
  • Up to 80 cm

Synthesis Chemical/Materials > Materials > Thin film deposition > Evaporation

IAD vacuum deposition system able to coat large components up to 80 cm in diameter. Deposition of oxide (SiO2, HfO2, Ta2O5, ,.. ), of metallic layers (Cr, Ag, Au...). Realizations of any type of optical components (mirrors, antireflections, dichroic ...)

Contact Task Facility Manager (TFM)

0472432668

Depending structure

IPNL

4 Rue Enrico Fermi
Bât; Dirac - Campus de la DOUA
69622 Villeurbanne
0472447996

infos : Website

Other's Laboratory/Plateforme

Email


Laboratory : Laboratoire Matériaux Avancés

Laurent Pinard

Directeur

Depending structure : IPNL
Federation :

FRAMA


Lab tutorship :

CNRS/IN2P3 - UCBL


7 Avenue Pierre de Coubertin
Bâtiment Virgo - - Campus de la Doua
69622 Villeurbanne

Full support :
Continuous education :
Access with light support :
Open to academic :
Open to enterprises :

MEANS.FR

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